Custom Capabilities

Using custom fabrication to meet your needs, we fulfill custom membrane silicon fabrication requests for a wide range of applications.

We offer services ranging from genomic and photonic biosensors and microfluidic cell culture to protein and nanoparticle separations and high resolution, environmental electron, x-ray microscopy, and silicon membrane fabrication. Below are some of our most popular custom solutions including custom silicon membranes.

silicon wafer specifications
Silicon Wafer Specifications
  • 100 and 150 mm diameter preferred
  • Range of thickness, orientation, resistivity, type, etc.
  • Alternative Materials: Possible
custom mask design & mask printing
In-House Mask Design & Lithography
Specifications
  • Feature size resolution to 350 nanometers (line/space resolution)
  • Capabilities: Hard/Soft Contact & 5x reduction stepper technology
  • Layer-to-layer Alignment: 0.05 µm to 5 µm (Substrate dependent)
  • Front-to-back Alignment: <5 µm to 20 µm (Substrate dependent)
Silicon-Based Deposition
  • Amorphous Silicon: PVD deposited 5 to 50 nm thick
  • Single/Poly Crystalline Silicon: As thin as 25nm thick
  • Silicon Dioxide: Thermal, Sputter, or PECVD 10-4,000 nm thick
  • Silicon Nitride: Stoichiometric and Si-rich LPCVD 5-2,000 nm thick
metal deposition
Metal-Based Deposition
  • e-Beam and/or thermal evaporation of Al, Au, Ag, Cr, Ti, Ge, Ni, and more at ~3-200 nm thick
  • Lift-off Features: Down to 5 µm
chemical vapor deposition
Surface Functionalization
  • Wide range of monolayer-forming chemistries
  • Chemical Vapor Deposition or Anhydrous Solvent / Solution deposition processing
device packaging
Device Packaging
  • Singulation by multiple methods – Customizable side profile
  • Pick-and-place packaging of dies into trays
  • Robotic assembly into devices
  • Laser marking of wafers and individual dies or devices
Laser Processing
  • Debris-free, non-contact die singulation
  • Ultra-Fast / Ultra-Short Pulsed laser marking, <12 micron spot size
  • Multiple laser processing / converting systems: CO2, MOPA, pulsed ns/ps/fs

While we will custom-create any substrate for your needs, we most often find ourselves working with these popular custom silicon membrane fabrication materials.

pure silicon
Pure Silicon
  • Amorphous, Single Crystal, or Nanocrystalline
  • Sputter deposited 5 to 50 nm thick
  • Nanocrystalline films are nanoporous with tunable pore sizes from 5 to 75 mm
silicon dioxide
Silicon Dioxide
  • Amorphous silicon dioxide
  • G-FLAT™ exclusive ultra-flat oxide
  • Thermal, Sputter, or PECVD deposition
  • Thicknesses from 20 to 4000 nm
silicon nitride
Silicon Nitride
  • Amorphous silicon nitride
  • LPCVD Low stress – tunable
  • Thicknesses from 5 to 2000 nm
  • Ultra-flat suspended membranes

Send us a brief summary of your project’s requirements and we’ll get back to you with a custom evaluation.

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